Timeline for Is it possible to expose dry photoresist film to UV before applying to copper for etching?
Current License: CC BY-SA 4.0
6 events
| when toggle format | what | by | license | comment | |
|---|---|---|---|---|---|
| Oct 22, 2023 at 21:05 | comment | added | DKNguyen | To enable something to be paste-and-peeled, it needs to be an adhesive, with adhesive memory, as well as sufficient structure. The film, being a cured liquid has none of these. Also, most materials absorb UV strongly so your layers of protective plastic would just block the UV during exposure if it's on both sides. And even if they did not absorb UV, would introduce a space between the shadow mask and the photoresist as well as lensing effects. | |
| Oct 22, 2023 at 18:31 | comment | added | Daniel | In the scenario I described @DKNguyen, the film would be exposed while both protective plastic films are present. After exposure, the protective film is removed from one side. The image remains undistored at that point and can be adhered to the copper. | |
| Oct 21, 2023 at 1:28 | vote | accept | Daniel | ||
| Oct 21, 2023 at 1:18 | comment | added | DKNguyen | The film is not a like a thin sheet of plastic. It's a a layer of cured liquid. You can't handle it by itself, nor adhere it to anything. | |
| Oct 21, 2023 at 1:12 | answer | added | Tom Carpenter | timeline score: 2 | |
| Oct 21, 2023 at 0:58 | history | asked | Daniel | CC BY-SA 4.0 |