Need some suggestions as to what techniques one could possibly adopt to reduce wafer thickness to 50 µm or less while fulfilling these 2 conditions :
- Surface roughmess, Ra < 3nm
- Total Thickness Variation < 3µm
Need some suggestions as to what techniques one could possibly adopt to reduce wafer thickness to 50 µm or less while fulfilling these 2 conditions :
May be you need to buy the right equipment ?
http://eesemi.com/backgrind.htm
http://www.syagrussystems.com/wafer-backgrinding