Lets put some genuine theory into this topic.
1 micron cube of silicon has Thermal Timeconstant of 11.4 nanoseconds.
10 micron cube of silicon has Timeconstant 100X slower, or 1140 nanoSeconds (1.14uS)
100 micron cube of silicon has Timeconstant another 100X slower, or 114 microSeconds.
With wafers often processed as 300 micron thick silicon discs, the Timeconstant is 3*3 slower, or 1000 uS or 1 millisecond.
Now let's put this 0.3mm thick slab of silicon atop a 3,000 micron (3mm) thick slab of copper (the TO-220 mounting tab?) which with 10X more thickness makes the Thermal Timeconstant yet another 10X10 slower, to 100 milliSeconds. We can do this because the Thermal Taus of silicon and of copper are nearly the same.
What does all this mean? Unless the pulse duration is > 0.1 seconds, almost all the heat HAS TO REMAIN inside the silicon/copper. The thermal capacity of that bi-metallic structure will be storing the heat during that 0.1 second (or shorter) pulse.
You can set up an Finite Element Model. Or use these following rules-of-thumb.
In 11.4 nanoseconds, most of the heat propagates less than 1 micron.
In 1140 nanoseconds, most of the heat propagates less than 10 microns.
In 114000 nanoseconds (114 microSeconds) most of the heat propagates less than 100 microns.
etc etc