Refer to @Briandrummond's answer for the original question. As to how the phosphor gets into the exactly correct locations (below from Phosphor Handbook 2nd Edition):
The slurry process is the typical process used for manufacturing
mosaic screens. Figure 22 shows the steps in the process: A suspension
is prepared by dispersing phosphor powders in an aqueous polyvinyl
alcohol (PVA) solution. An aqueous dichromate solution is added to the
suspension to make the mixture photosensitive. The mixture is called a
slurry; hence the name of the process. A glass panel is set face-down
in a spin-coating machine. The slurry is dispensed onto the panel
while the glass is rotated slowly with a small tilt angle. The slurry
is allowed to spread evenly on the inside surface of the panel without
bubbles and using a minimal slurry volume. The panel rotation is then
increased to obtain the desired screen thickness on the panel. Any
excess slurry is recycled. The coating on the panel is dried with an
infrared heater.
The panel is then exposed to light after an appropriate shadow mask
(or an aperture grill) has been placed within the panel. The exposure
system is equipped with an ultraviolet (UV) light source (mercury-arc
lamp) at the site corresponding to the deflection center of the
electron gun of the cathode-ray tube to be finished; the system is
equipped with a lens that equalized the light beam path to that of the
electron beam trajectory, and with a shader plate that controls the
light intensity distribution along the panel surface. Generally, a
pattern size (dot diameter or stripe width) increases with light
intensity for a given exposure time. Therefore, the distribution of
the light intensity along the panel surface has to be controlled by
employing the shader plate, which corrects the intensity of light from
the arc lamp. After exposure, the coating is developed by spraying hot
water to wash out phosphors in unexposed areas.
The PVA-dichromate system works here as a negative photoresist. The
slurry process, in a word, is photolithographic, employing a shadow
mask as a photomask. The only difference between the slurry process
and other photolithographic processes is that a given shadow-mask
cannot be used to expose other individual panels, whereas a general
photomask is repeatedly used to reproduce the same patterns on many
substrates.
Note: Also mentioned are a Dusting Process which uses dry phosphor dust and PVA-dichromate and Phototacky process as well as several other processes. Available in the book, which is worth having on your shelf.