For creating PCBs, I use the following process:
- Project the layout on a PCB (with a pre-applied positive photoresist layer)
- Reveal the mask with sodium metasilicate pentahydrate saturated solution
- Etching with Na2Si2O8 solution
- Clean the mask with acetone
This process has been successful tens of times until last usage (like 3 years ago)(yes, long time).
Now, trying to reveal the mask with the already prepared sodium metasilicate (3 years old solution) does not seem to have any effect on the photoresist (same box, 3 years old).
My hypotheses are:
- The photoresist has degradated over time, making it less sensitive to light.
- The sodium metasilicate has degradated over time (maybe absorbing some substance from air, as the bottle was not well closed and water evaporated).
Is this deterioration of PCB photoresist or sodium metasilicate known? Which? (or should I look into some other direction)